Chinese startup claims photonic chip production without DUV lithography, says nanoimprint process cuts costs by 90% — 8-inch wafers produced without conventional optical lithography
Chinese startup Prinano has announced a breakthrough in photonic chip production, utilizing a novel nanoimprint lithography (NIL) process. This method reportedly bypasses the need for expensive deep-ultraviolet (DUV) lithography equipment, cutting manufacturing costs by approximately 90%. The company has successfully produced 8-inch photonic chip wafers, a significant development that could help circumvent US export restrictions on advanced semiconductor technology. AI
IMPACT This advancement in photonic chip manufacturing could accelerate the development of more efficient AI hardware by reducing production costs and circumventing export controls.